Siemens has expanded its digital design automation (EDA) capabilities by buying Canopus AI, an organization specialising in AI-driven metrology options for the semiconductor trade.
The monetary particulars of the deal weren’t disclosed by the German conglomerate.
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The acquisition was made by Siemens EDA, a part of Siemens Digital Industries Software program, and goals to boost precision and effectivity inside wafer and masks inspection processes, essential for superior semiconductor manufacturing.
Canopus AI’s know-how will combine with Siemens’ present Calibre Computational Lithography and Manufacturing Physics Simulation platform. This mixture is designed to supply a complete end-to-end EDA resolution, offering semiconductor producers with the instruments wanted to optimise design accuracy and enhance operational effectivity.
The combination is anticipated to lead to improved constancy of printed wafer patterns and quicker yield ramps, that are essential because the trade continues to push into the angstrom period the place dimensions are measured in fractions of a nanometer.
In response to Siemens, the acquisition comes at a time when the semiconductor trade faces more and more advanced challenges as a consequence of shrinking system geometries and rising manufacturing volumes.
Huge metrology, which refers back to the exact measurement and evaluation of constructions, is important for sustaining high quality and yield in superior fabrication processes. Canopus AI’s options are designed to satisfy these calls for by providing superior AI-powered inspection and measurement capabilities, stated Siemens.
Based in 2021 in Grenoble, France, Canopus AI has developed ‘Metrospection,’ a novel strategy that enhances wafer and masks metrology workflows via AI.
The corporate’s experience in huge ebeam metrology gives excessive information throughput and accuracy for optical proximity correction/decision enhancement know-how (OPC/RET) functions. That is stated to allow strong edge placement error (EPE) primarily based measurements, early defect identification, and intensive characterisation of course of variations.
The acquisition additionally facilitates the enlargement of Siemens’ semiconductor design and manufacturing digital thread by incorporating Canopus AI’s cutting-edge applied sciences. Via this addition, Siemens goals to supply a high-accuracy semiconductor manufacturing digital twin that permits sub-nanometer course of management and masks improvement. That is notably very important as producers attempt to satisfy the intense precision necessities of superior know-how nodes.
Siemens Digital Business Software program president and CEO Tony Hemmelgarn stated: “The acquisition of Canopus AI exemplifies Siemens’ dedication to leveraging industrial AI to unravel essential challenges in semiconductor manufacturing.
“By combining the computational lithography and manufacturing physics simulation functionality in our Calibre portfolio with Canopus-AI’s superior metrology and inspection applied sciences, we’re making a differentiated, end-to-end EDA digital thread that improves the constancy of printed wafer patterns, accelerates yield ramp and reduces time-to-volume for superior nodes.
“This integration additional advances our imaginative and prescient of a complete, high-accuracy, semiconductor manufacturing digital twin, enabling sub-nanometer course of management and masks improvement.”
Canopus AI extends its choices past two-dimensional metrology with superior transmission electron microscopy (TEM) for three-dimensional insights. This functionality is powered by an engine for artificial 2D and 3D scanning electron microscopy (SEM) picture era. By leveraging AI and machine studying algorithms, this platform helps computational metrology from vertex-based to pixel-based geometries.
Additional capabilities embody multigon information assist and native curvilinear information operations, that includes best-in-class CD SEM picture processing algorithms. The platform permits for automated processing of a whole lot of hundreds of CD SEM pictures, facilitating fast recipe tuning from information filtering to gauge-based or EPE-based measurements.
Canopus AI’s SEM contour extraction know-how will combine with Calibre’s contour-based OPC/Etch ML mannequin calibration, reaching angstrom-level mannequin accuracy with improved runtime efficiency. Moreover, the platform gives automated course of window calculation from SEM pictures collected below numerous focus and dose situations, supporting manufacturing course of management by monitoring minute adjustments in SEM picture contours throughout chip manufacturing.
Canopus AI CEO Joël Alanis stated: “We’re delighted to affix Siemens and convey the facility of AI-enabled metrology within the semiconductor trade to a broader viewers as a part of Siemens’ EDA group of customers.
“Collectively, we’ll empower innovators pushing the boundaries of semiconductor design and manufacturing with strong wafer and masks metrology and inspection and assist them to satisfy the challenges of the quickly altering semiconductor trade.”
Previous to this acquisition, Siemens introduced a partnership with GlobalFoundries (GF) in December 2025, aimed toward integrating AI-driven applied sciences into semiconductor manufacturing to boost effectivity and reliability.
The collaboration covers areas akin to fab automation, electrification, and the deployment of digital options all through the semiconductor lifecycle. The initiative focuses on implementing superior AI-enabled software program, sensors, and real-time management methods inside fabrication environments.
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